Kolev K.Petkova T.Popov C.Petkov P.2024-07-102024-07-102024-07-102024-07-102008-05-011742-65961742-658810.1088/1742-6596/113/1/012024SCOPUS_ID:44649187520https://rlib.uctm.edu/handle/123456789/142The mechanical behaviour of chalcogenide thin films is of great importance for a variety of applications. The requirements for homogeneity, uniformity, surface smoothness, excellent adhesive strength and minimal residual stress are decisive for the technological performance of thin films in the field of optical and sensor devices. Thin films from the system have been prepared by vacuum thermal evaporation from the corresponding bulk glasses. The film structure and surface morphology have been studied by scanning electron microscopy (SEM) and atomic force microscopy (AFM). The investigated chalcogenide films are amorphous as revealed by XRD, featureless and with smooth surfaces viewed from the AFM pictures. The stress measurements of the thin films deposited on silicon cantilevers have been carried out by cantilever bending technique. The results obtained have been discussed with respect to the film composition and structure. The change of the stress from tensile to compressive registered in the films with AgI content higher than 15 mol. % could be explained with structural transformations. © 2008 IOP Publishing Ltd.enArticle