Durina P.Bencurova A.Konecnikova A.Kostic I.Vutova K.Koleva E.Mladenov G.Kus P.Plecenik A.2024-07-102024-07-102024-07-102024-07-102014-01-011742-65961742-658810.1088/1742-6596/514/1/012037SCOPUS_ID:84902169997https://rlib.uctm.edu/handle/123456789/308This work deals with a method of preparation of nanometer structures for a gas detector based on e-beam lithography and ion etching of a thin TiO2 film. The aim was the fabrication of a gas sensor with meander or comb structures of nanometer dimensions. This is of importance since both the size of the contacts and the layer thickness affect the sensor's sensitivity.enPatterning of structures by e-beam lithography and ion etching for gas sensor applicationsConference Paper