Ivanova T.Gesheva K.A.Abrashev M.Sharlandjiev P.Nazarova D.2024-07-102024-07-102024-07-102024-07-102010-01-011742-65961742-658810.1088/1742-6596/223/1/012039SCOPUS_ID:77954753862https://rlib.uctm.edu/handle/123456789/194Mixed oxide films based on Mo and W were successfully prepared by atmospheric pressure CVD at the low substrate temperature of 200oC. High amount of oxygen was used to ensure a high degree of oxidation resulting in more stoichiometric oxide films. The structural transformations under different thermal treatments were studied by Raman spectroscopy and FTIR spectroscopy analysis. The films were characterized electrochemically by cyclic voltammetry using different electrolytes, scan rates, etc. The mixed oxide films exhibited a strong electrochromic (EC) effect. © 2010 IOP Publishing Ltd.enConference Paper