ELECTRON BEAM LITHOGRAPHY PROCESS QUALITY IMPROVEMENT BY ROBUST ENGINEERING APPROACH

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creativework.keywordselectron beam lithography, industrial process optimization, quality improvement, robust engineering
creativework.publisherUniversity of Chemical Technology and Metallurgyen
dc.contributor.authorKoleva L.
dc.contributor.authorAsenova-Robinzonova A.
dc.contributor.authorKoleva E.
dc.date.accessioned2024-07-10T14:27:06Z
dc.date.accessioned2024-07-10T14:51:32Z
dc.date.available2024-07-10T14:27:06Z
dc.date.available2024-07-10T14:51:32Z
dc.date.issued2024-01-01
dc.description.abstractThe model-based robust approach is successfully applied to different industrial processes for improving their quality performance characteristics. The Robust engineering approach is implemented in cases of heteroscedasticity of the performance characteristics in presence of errors in the process parameters or noise factors, which is typical for the production processes. Higher quality and reproducibility of the quality characteristics can be achieved both for existing production processes or for technological process design at the production planning and development stages. In this paper the model-based robust engineering approach is implemented for the quality improvement of polymethyl methacrylate (PMMA) resist profiles, obtained by electron beam lithography process. Specific technological requirements concerning the developed profile structures, their variances (reproducibility) in production conditions and robustness toward the errors in the process parameters, are considered. Different multicriteria optimization approaches were applying and compared, aiming to simultaneously fulfil the requirements for the geometric characteristics of the positive resist PMMA.
dc.identifier.doi10.59957/JCTM.V59.I2.2024.24
dc.identifier.issn1314-7978
dc.identifier.issn1314-7471
dc.identifier.scopusSCOPUS_ID:85193059320en
dc.identifier.urihttps://rlib.uctm.edu/handle/123456789/944
dc.language.isoen
dc.source.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85193059320&origin=inward
dc.titleELECTRON BEAM LITHOGRAPHY PROCESS QUALITY IMPROVEMENT BY ROBUST ENGINEERING APPROACH
dc.typeArticle
oaire.citation.issue2
oaire.citation.volume59
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