Characterization of anodized Al 1050 with electrochemically deposited Cu, Ni and Cu/Ni and their behavior in a model corrosive medium

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creativework.keywordsAA1050, AC-electrochemical deposition, Anodization, Copper, Nickel
creativework.publisherKorean Electrochemical Societyen
dc.contributor.authorGirginov C.
dc.contributor.authorKozhukharov S.
dc.contributor.authorTsanev A.
dc.contributor.authorDishliev A.
dc.date.accessioned2024-07-10T14:27:05Z
dc.date.accessioned2024-07-10T14:50:02Z
dc.date.available2024-07-10T14:27:05Z
dc.date.available2024-07-10T14:50:02Z
dc.date.issued2021-01-01
dc.description.abstractThe specific benefits of the modified films formed on preliminary anodized aluminum, including the versatility of their potential applications impose the need for evaluation of the exploitation reliability of these films. In this aspect, the dura-bility of Cu and Ni modified anodized aluminum oxide (AAO) films on the low-doped AA1050 alloy was assessed through extended exposure to a 3.5% NaCl model corrosive medium. The electrochemical measurements by means of electrochemical impedance spectroscopy (EIS) and potentiodynamic scanning (PDS) after 24 and 720 hours of exposure have revealed that the obtained films do not change their obvious barrier properties. In addition, supplemental analyses of the coatings were performed, in order to elucidate the impact of the AC-deposition of Cu and Ni inside the pores. The scanning electron microscopy (SEM) images have shown that the surface topology is not affected and resembles the typical surface of an etched metal. The subsequent energy dispersive X-ray spectroscopy (EDX) tests have revealed a predominance of Cu in the combined AAO-Cu/Ni layers, whereas additional X-ray photoelectron (XPS) analyses showed that both metals form oxides with different oxidation states due to alterations in the deposition conditions, promoted by the application of AC-polarization of the samples.
dc.identifier.doi10.33961/JECST.2020.01235
dc.identifier.issn2288-9221
dc.identifier.issn2093-8551
dc.identifier.scopusSCOPUS_ID:85109150906en
dc.identifier.urihttps://rlib.uctm.edu/handle/123456789/655
dc.language.isoen
dc.source.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85109150906&origin=inward
dc.titleCharacterization of anodized Al 1050 with electrochemically deposited Cu, Ni and Cu/Ni and their behavior in a model corrosive medium
dc.typeArticle
oaire.citation.issue2
oaire.citation.volume12
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