Conduction Mechanism of the Passive Film on Iron Based on Contact Electric Impedance and Resistance Measurements

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dc.contributor.authorBojinov M.
dc.contributor.authorLaitinen T.
dc.contributor.authorMäkelä K.
dc.contributor.authorSaario T.
dc.date.accessioned2024-07-10T14:27:02Z
dc.date.accessioned2024-07-10T14:46:52Z
dc.date.available2024-07-10T14:27:02Z
dc.date.available2024-07-10T14:46:52Z
dc.date.issued2001-06-01
dc.description.abstractThe application of a mixed conduction model and a new contact electric impedance (CEI) technique to predict quantitatively the electronic and ionic transport properties of oxide films on iron in a nearly neutral tetraborate solution is discussed. The mixed-conduction model emphasizes the coupling between the ionic defect structure and the electronic conductivity in an anodic film. Conventional electrochemical techniques have not been sufficient to characterize properly the electronic and ionic properties of anodic films on metals. The CEI technique makes it possible to distinguish between processes taking place at different rates within oxide films. Using this technique together with the contact electric resistance technique, we have found that the diffusion coefficient for the electronic conduction in the anodic film on iron is several orders of magnitude higher than that for the ionic transport. This shows that the passive film on iron is predominantly an electronic conductor. The fitting of the experimental results to the mixed conduction model gives a good agreement and thus supports the validity of this model in the present case. © 2001 The Electrochemical Society. [DOI: 10.1149/1.1371476] All rights reserved.
dc.identifier.doi10.1149/1.1371976
dc.identifier.issn0013-4651
dc.identifier.scopusSCOPUS_ID:0001012609en
dc.identifier.urihttps://rlib.uctm.edu/handle/123456789/41
dc.language.isoen
dc.source.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=0001012609&origin=inward
dc.titleConduction Mechanism of the Passive Film on Iron Based on Contact Electric Impedance and Resistance Measurements
dc.typeArticle
oaire.citation.issue6
oaire.citation.volume148
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