Ion - Beam assisted process in the physical deposition of organic thin layers

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creativework.publisherInstitute of Physics Publishingen
dc.contributor.authorDimov D.
dc.contributor.authorGeorgiev A.
dc.contributor.authorSpassova E.
dc.contributor.authorAssa J.
dc.contributor.authorDanev G.
dc.date.accessioned2024-07-10T14:27:03Z
dc.date.accessioned2024-07-10T14:47:28Z
dc.date.available2024-07-10T14:27:03Z
dc.date.available2024-07-10T14:47:28Z
dc.date.issued2010-01-01
dc.description.abstractA novel method was developed for physical deposition of thin polyimide layers by applying an argon plasma assisted process. The influence was investigated of the plasma on the combined molecular flux of the two thermally evaporated precursors - oxydianiline and pyromellitic dianhydride. The effects observed on the properties of the deposited films are explained with the increased energy of the precursor molecules resulting from the ion-molecular collisions. As could be expected, molecules with higher energy possess higher mobility and thus determine the modification of the films structure and their electrical properties. © 2010 IOP Publishing Ltd.
dc.identifier.doi10.1088/1742-6596/223/1/012034
dc.identifier.issn1742-6596
dc.identifier.issn1742-6588
dc.identifier.scopusSCOPUS_ID:77954691466en
dc.identifier.urihttps://rlib.uctm.edu/handle/123456789/191
dc.language.isoen
dc.source.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=77954691466&origin=inward
dc.titleIon - Beam assisted process in the physical deposition of organic thin layers
dc.typeConference Paper
oaire.citation.issue1
oaire.citation.volume223
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