Potential possibilities of a new method for yield stress determination

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creativework.keywordsEllis liquid, Film flow, Rotating disk, Yield stress determination
creativework.publisherUniversity of Chemical Technology and Metallurgyjournal@uctm.eduen
dc.contributor.authorPeev G.
dc.contributor.authorPeshev D.
dc.contributor.authorNikolova A.
dc.date.accessioned2024-07-16T11:16:47Z
dc.date.accessioned2024-07-16T11:18:23Z
dc.date.available2024-07-16T11:16:47Z
dc.date.available2024-07-16T11:18:23Z
dc.date.issued2016-01-01
dc.description.abstractOne-D solution for the hydrodynamic characteristics of waveless film flow of an Ellis liquid on a horizontal rotating disk is obtained and considered for determination of the liquid yield stress. Several versions of the method based on the film thickness of the remaining liquid on the disk at a zero feed flow rate are proposed. Verification that such layer remains is provided. The limitations of the method advanced which refer to wave formation, film breakup, liquid adhesion and disk wetting are discussed in view of its application in rheometry.
dc.identifier.issn1314-7978
dc.identifier.issn1314-7471
dc.identifier.scopusSCOPUS_ID:84965017417en
dc.identifier.urihttps://rlib.uctm.edu/handle/123456789/1134
dc.language.isoen
dc.source.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84965017417&origin=inward
dc.titlePotential possibilities of a new method for yield stress determination
dc.typeArticle
oaire.citation.issue3
oaire.citation.volume51
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