Patterning of structures by e-beam lithography and ion etching for gas sensor applications

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creativework.publisherInstitute of Physics Publishinghelen.craven@iop.orgen
dc.contributor.authorDurina P.
dc.contributor.authorBencurova A.
dc.contributor.authorKonecnikova A.
dc.contributor.authorKostic I.
dc.contributor.authorVutova K.
dc.contributor.authorKoleva E.
dc.contributor.authorMladenov G.
dc.contributor.authorKus P.
dc.contributor.authorPlecenik A.
dc.date.accessioned2024-07-10T14:27:03Z
dc.date.accessioned2024-07-10T14:48:04Z
dc.date.available2024-07-10T14:27:03Z
dc.date.available2024-07-10T14:48:04Z
dc.date.issued2014-01-01
dc.description.abstractThis work deals with a method of preparation of nanometer structures for a gas detector based on e-beam lithography and ion etching of a thin TiO2 film. The aim was the fabrication of a gas sensor with meander or comb structures of nanometer dimensions. This is of importance since both the size of the contacts and the layer thickness affect the sensor's sensitivity.
dc.identifier.doi10.1088/1742-6596/514/1/012037
dc.identifier.issn1742-6596
dc.identifier.issn1742-6588
dc.identifier.scopusSCOPUS_ID:84902169997en
dc.identifier.urihttps://rlib.uctm.edu/handle/123456789/308
dc.language.isoen
dc.source.urihttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84902169997&origin=inward
dc.titlePatterning of structures by e-beam lithography and ion etching for gas sensor applications
dc.typeConference Paper
oaire.citation.issue1
oaire.citation.volume514
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